The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2015
Filed:
Dec. 14, 2011
Applicant:
Kazuhiko Fukazawa, Kamakura, JP;
Inventor:
Kazuhiko Fukazawa, Kamakura, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); G01N 21/94 (2006.01); G01N 21/95 (2006.01); G01N 21/956 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G01N 21/9501 (2013.01); G01N 21/95607 (2013.01); G03F 7/70641 (2013.01); G03F 7/70783 (2013.01); G01N 21/94 (2013.01);
Abstract
There is provided an inspection method for inspecting a substrate supporting portion configured to support a substrate during an exposure performed by an exposure apparatus, the method including: irradiating a surface of the exposed substrate with an illumination light beam; detecting reflected light from a pattern in the irradiated surface; determining a focusing state at the time of exposing the pattern of the substrate based on the detected reflected light; and inspecting a state of the substrate supporting portion based on the focusing state.