The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2015
Filed:
Aug. 23, 2012
Rui Xu, Shenzhen, CN;
Weiwei Zhang, Shenzhen, CN;
Jingming Wu, Shenzhen, CN;
Honghui Zhu, Shenzhen, CN;
LI Wang, Shenzhen, CN;
Xiaobo He, Shenzhen, CN;
Hongqing Huang, Shenzhen, CN;
Rui Xu, Shenzhen, CN;
Weiwei Zhang, Shenzhen, CN;
Jingming Wu, Shenzhen, CN;
Honghui Zhu, Shenzhen, CN;
Li Wang, Shenzhen, CN;
Xiaobo He, Shenzhen, CN;
Hongqing Huang, Shenzhen, CN;
Shenzhen China Star Optoelectronics Technology Co., Ltd., Shenzhen, Guangdong Province, CN;
Abstract
The present invention provides a potentiometric titration method for measuring concentration of acid mixture of aluminum etchant, which prepares identified potassium hydroxide-ethanol solution or sodium hydroxide-ethanol solution as a titrant and uses a monohydric alcohol and a diol as an anhydrous medium for the acid mixture of aluminum etchant to carry out titration of the acid mixture of aluminum etchant so as to realize measurement of concentration of each acid contained in the acid mixture of aluminum etchant through a one-stage process of potentiometric titration thereby reducing the complication of operation of inspection and uncertainty of inspection result and achieving the purposes of carrying out inspections with high precision and high performance. The method can efficiently and accurately measure the concentrations of nitric acid, phosphoric acid, and acetic acid contained in the acid mixture of aluminum etchant.