The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2015
Filed:
Nov. 13, 2007
Karsten Agersted Nielsen, Roskilde, DK;
Søren Linderoth, Roskilde, DK;
Peter Vang Hendriksen, Hilleroed, DK;
Åsa Persson, Taastrup, DK;
Lars Mikkelsen, Roskilde, DK;
Niels Christiansen, Gentofte, DK;
Jørgen Gutzon Larsen, Bagsværd, DK;
Karsten Agersted Nielsen, Roskilde, DK;
Søren Linderoth, Roskilde, DK;
Peter Vang Hendriksen, Hilleroed, DK;
Åsa Persson, Taastrup, DK;
Lars Mikkelsen, Roskilde, DK;
Niels Christiansen, Gentofte, DK;
Jørgen Gutzon Larsen, Bagsværd, DK;
Technical University of Denmark, Kgs. Lyngby, DK;
Topsoe Fuel Cell A/S, Kgs. Lyngby, DK;
Abstract
The present invention provides a method of producing a multilayer barrier structure in a solid oxide cell stack, comprising the steps of: —providing a metal interconnect; —applying a first metal oxide layer on said metal interconnect; —applying a second metal oxide layer on top of said first metal oxide layer; —applying a third metal oxide layer on top of said second metal oxide layer; —forming a solid oxide cell stack comprising said metal interconnect having said metal oxide layers thereon; and —reacting the metal oxide in said first metal oxide layer with the metal of said metal interconnect during the SOC-stack initialization, and a solid oxide stack comprising an anode contact layer and support structure, an anode layer, an electrolyte layer, a cathode layer, a cathode contact layer, a metallic interconnect, and a multilayer barrier structure which is obtainable by the above method and through an initialization step, which is carried out under controlled conditions for atmosphere composition and current load, which depends on the layer composition facilitating the formation of the desired reaction products as a dense barrier layer without chromium species migrating to the air-electrode.