The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2015
Filed:
Mar. 26, 2012
Applicant:
Tetsuhiro Iwai, Osaka, JP;
Inventor:
Tetsuhiro Iwai, Osaka, JP;
Assignee:
Panasonic Corporation, Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01L 21/30 (2006.01); G01R 31/00 (2006.01); B05C 13/00 (2006.01); H01L 21/673 (2006.01); H01L 21/677 (2006.01); H01L 21/68 (2006.01); H01L 21/687 (2006.01); B44C 1/22 (2006.01); C23C 16/50 (2006.01);
U.S. Cl.
CPC ...
B05C 13/00 (2013.01); H01L 21/6732 (2013.01); H01L 21/67742 (2013.01); H01L 21/67754 (2013.01); H01L 21/681 (2013.01); H01L 21/68764 (2013.01); H01L 21/68771 (2013.01); B44C 1/227 (2013.01); C23C 16/50 (2013.01);
Abstract
The present invention is to achieve a reduction both in size of a plasma processing apparatus and an installation area thereof. A dry etching apparatus includes a stock unit that includes a cassette storing a tray that can be conveyed and that stores substrates. In a conveying unit storing a conveying apparatus of the tray, a rotary stage is provided. Rotational angular position adjustment of the tray is performed by rotating the rotary stage placed on the tray before being subjected to dry etching and detecting a notch by a notch detecting sensor.