The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 03, 2015

Filed:

Jan. 14, 2004
Applicants:

Ting He, Dublin, OH (US);

Eric R. Kreidler, Pickerington, OH (US);

Tadashi Nomura, Dublin, OH (US);

Inventors:

Ting He, Dublin, OH (US);

Eric R. Kreidler, Pickerington, OH (US);

Tadashi Nomura, Dublin, OH (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 14/04 (2006.01); C23C 14/54 (2006.01); C23C 14/50 (2006.01);
U.S. Cl.
CPC ...
C23C 14/50 (2013.01); C23C 14/042 (2013.01); C23C 14/548 (2013.01);
Abstract

An infinitely variable physical vapor deposition matrix system that allows the synthesis of multiple combinatorial catalyst samples at essentially the same time, by the co-deposition of multiple materials, or the sequential layer by layer deposition of multiple catalyst constituents, or both, such that the optimum mix of materials for a pre-determined application can be experimentally determined in subsequent testing. The discovery of optimal catalyst combinations for utilization in specified reactions and devices is facilitated. The high throughput system reduces the time and complexity of processing typically required to formulate and test combinatorial catalyst materials.


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