The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 03, 2015

Filed:

Aug. 27, 2010
Applicants:

Sinue Gomez, Corning, NY (US);

Lisa Anne Moore, Corning, NY (US);

Sergio Tsuda, Horseheads, NY (US);

Inventors:

Sinue Gomez, Corning, NY (US);

Lisa Anne Moore, Corning, NY (US);

Sergio Tsuda, Horseheads, NY (US);

Assignee:

Corning Incorporated, Corning, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03B 33/02 (2006.01); C03B 33/04 (2006.01); C03B 33/09 (2006.01);
U.S. Cl.
CPC ...
C03B 33/0222 (2013.01); C03B 33/04 (2013.01); C03B 33/091 (2013.01);
Abstract

A method of cutting an article () from a chemically strengthened glass substrate () includes generating a pulsed laser beam () from a laser source (). The pulsed laser beam () may have a pulse duration of less than about 1000 fs and an output wavelength such that the chemically strengthened glass substrate () is substantially transparent to the pulsed laser beam (). The pulsed laser beam () may be focused to form a beam waist () that is positioned in the same horizontal plane as an inner tensile region () of the chemically strengthened glass substrate (). The beam waist () may be translated in a first pass along a cut line (), wherein the beam waist () traverses an edge () of the chemically strengthened glass substrate. The beam waist () may then be translated in a second pass along the cut line () such that a crack () propagates from the edge () along the cut line () ahead of the translated beam waist () during the second pass.


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