The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2015
Filed:
Mar. 31, 2010
David Roger Moore, Rexford, NY (US);
Hongyi Zhou, Niskayuna, NY (US);
Matthew Jeremiah Misner, Delanson, NY (US);
Xiaohui Chen, Niskayuna, NY (US);
Lifeng Zhang, Clifton Park, NY (US);
Daniel Joseph Brunelle, Burnt Hills, NY (US);
Minglin MA, Cambridge, MA (US);
David Roger Moore, Rexford, NY (US);
Hongyi Zhou, Niskayuna, NY (US);
Matthew Jeremiah Misner, Delanson, NY (US);
Xiaohui Chen, Niskayuna, NY (US);
Lifeng Zhang, Clifton Park, NY (US);
Daniel Joseph Brunelle, Burnt Hills, NY (US);
Minglin Ma, Cambridge, MA (US);
General Electric Company, Niskayuna, NY (US);
Abstract
A separation matrix comprises a porous surface layer; and a bulk porous support, wherein both the porous surface layer and the bulk porous support comprising a block copolymer. The block copolymer comprises A-B or A-B-A repeating units, wherein A and B at each occurrence are two different blocks of oligomer, or polymer. A structural unit of block A is derived from one or more atom transfer radical polymerization (ATRP)-active monomer or oligomer and a structural unit of block B is derived from a thermoplastic ATRP-active macro initiator. A poly dispersity index of the block copolymer is at least about 2.