The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 27, 2015

Filed:

Nov. 19, 2012
Applicant:

Shenzhen China Star Optoelectronics Technology Co., Ltd., Shenzhen, Guangdong, CN;

Inventors:

Yongqiang Wang, Guangdong, CN;

Chun hao Wu, Guangdong, CN;

Kun hsien Lin, Guangdong, CN;

Minghu Qi, Guangdong, CN;

Weibing Yang, Guangdong, CN;

Zenghong Chen, Guangdong, CN;

Zhenhua Guo, Guangdong, CN;

Yunshao Jiang, Guangdong, CN;

Zhiyou Shu, Guangdong, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B65G 13/075 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
B65G 13/075 (2013.01); H01L 21/6776 (2013.01);
Abstract

The present invention relates to a substrate transfer system, comprising a number of roller assemblies used for mobile transfer of the glass substrate on it, and a controller used for controlling rotation of the roller assemblies; the substrate transfer system further comprises a substrate positioning device, which is arranged at the end of the transfer direction of the glass substrate by the roller assemblies; the substrate positioning device comprises a positioning pole, which is used for blocking and positioning the glass substrate transferred by the roller assemblies; and a buffer positioning mechanism on which the positioning pole is mounted on, providing mobile buffer for the positioning pole and driving the positioning pole to reset. A buffer reset mechanism is arranged for controlling the position of the positioning pole, and the positioning deviation of the substrate can be further eliminated; it can provide buffer contact for eliminating the risk of fragmentation.


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