The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 20, 2015

Filed:

Oct. 19, 2010
Applicants:

Opher Etzion, Haifa, IL;

Nir Zolotorevsky, Kiriat Bialik, IL;

Inventors:

Opher Etzion, Haifa, IL;

Nir Zolotorevsky, Kiriat Bialik, IL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/30 (2006.01); G06F 9/54 (2006.01);
U.S. Cl.
CPC ...
G06F 17/30241 (2013.01); G06F 9/542 (2013.01);
Abstract

A method of optimizing runtime spatiotemporal events processing is provided. The method includes the following stages: defining a plurality of spatial contexts or spatiotemporal contexts; specifying a plurality of spatial patterns or spatiotemporal patterns being relationships between events complying with specified policies within the defined spatial contexts and spatiotemporal contexts respectively; identifying events of specified properties out of a stream of incoming events, based on the defined spatial contexts or the defined spatiotemporal contexts; detecting event patterns of specified properties out of the stream of incoming events by grouping the incoming events and applying a pattern matching process based on the specified spatial patterns or spatiotemporal patterns; adaptively generating a spatial evaluation plan that defines an order of processing such that event processing is optimized, based on off-line and runtime data; and processing the incoming events based on the order defined in the spatial evaluation plan.


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