The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 20, 2015

Filed:

Mar. 15, 2013
Applicant:

Nikon, Tokyo, JP;

Inventors:

Douglas C. Watson, Campbell, CA (US);

Travis Bow, East Palo Alto, CA (US);

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 5/04 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2008 (2013.01); G03F 7/70875 (2013.01); G03F 7/709 (2013.01);
Abstract

Methods and apparatus for reducing vibrations in an extreme ultraviolet (EUV) lithography system associated with the cooling of mirrors are described. According to one aspect of the present invention, an apparatus includes a first assembly, a structure, a vibration isolator, and a hose arrangement. The first assembly includes a heat exchanger and a mirror assembly. The structure is subject to vibrations, and the vibration isolator is arranged to attenuate the vibrations when the vibrations are transmitted through the hose arrangement. The hose arrangement being coupled between the heat exchanger and the structure, and the vibration isolator is coupled to the hose arrangement.


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