The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2015
Filed:
Jun. 21, 2013
Applicants:
Carolyn R. Ellinger, Rochester, NY (US);
Shelby F. Nelson, Pittsford, NY (US);
Kurt D. Sieber, Rochester, NY (US);
Inventors:
Carolyn R. Ellinger, Rochester, NY (US);
Shelby F. Nelson, Pittsford, NY (US);
Kurt D. Sieber, Rochester, NY (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01); H01L 21/31 (2006.01); H01L 21/469 (2006.01); H01L 21/308 (2006.01);
U.S. Cl.
CPC ...
H01L 21/308 (2013.01);
Abstract
A method of producing a patterned inorganic thin film element includes providing a substrate having a patterned thin layer of polymeric inhibitor on the surface. The substrate and the patterned thin layer of polymeric inhibitor are exposed to a highly reactive oxygen process. An inorganic thin film layer is deposited on the substrate in areas without inhibitor using an atomic layer deposition process.