The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2015
Filed:
May. 16, 2014
Applicant:
Fujifilm Corporation, Minato-ku, Tokyo, JP;
Inventor:
Yoichi Maruyama, Tokyo, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 27/00 (2006.01); G02B 1/11 (2006.01); G02B 3/00 (2006.01); G02B 7/02 (2006.01); B29D 11/00 (2006.01); G02B 13/00 (2006.01); H01L 27/146 (2006.01);
U.S. Cl.
CPC ...
G02B 1/11 (2013.01); G02B 3/0031 (2013.01); G02B 7/022 (2013.01); B29D 11/00009 (2013.01); G02B 13/0085 (2013.01); H01L 27/14627 (2013.01); G02B 13/001 (2013.01);
Abstract
A sufficient light-shielding property is obtained by a wafer level lens having at least one lens module having a substrate and a plurality of lenses formed on the substrate in which the wafer level lens has a black resist layer formed on the surface of the lens module or on the surface of the substrate and the black resist layer is formed with a pattern having an opening at a part intersecting the optical axis of the lens, and generation of defects such as ghosts, flares and the like due to a reflected light can be prevented and an increase in the production cost can be suppressed.