The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2015
Filed:
Dec. 26, 2013
Seiko Epson Corporation, Tokyo, JP;
Midori Misawa, Hara-mura, JP;
Tamotsu Goto, Chino, JP;
Seiko Epson Corporation, Tokyo, JP;
Abstract
A silicon nozzle plate has excellent liquid resistance on an inner surface of a nozzle opening and a discharge surface. A plurality of the nozzle openings are disposed in a silicon substrate of the nozzle plate. A first tantalum oxide film is disposed by atomic layer deposition on both surfaces of the silicon substrate and the inner surface of the nozzle opening, and a second tantalum oxide film that is formed by plasma CVD is stacked on the first tantalum oxide film of the discharge surface.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile