The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 13, 2015

Filed:

Aug. 10, 2012
Applicants:

Takuya Ido, Kyoto, JP;

Toshikazu Ohnishi, Kyoto, JP;

Tetsuya Mori, Otsu, JP;

Inventors:

Takuya Ido, Kyoto, JP;

Toshikazu Ohnishi, Kyoto, JP;

Tetsuya Mori, Otsu, JP;

Assignee:

Horiba, Ltd., Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/61 (2006.01); G01N 21/35 (2014.01); G01N 21/27 (2006.01); G01N 21/53 (2006.01); G01N 21/85 (2006.01);
U.S. Cl.
CPC ...
G01N 21/61 (2013.01); G01N 21/3504 (2013.01); G01N 21/274 (2013.01); G01N 2021/3513 (2013.01); G01N 2021/536 (2013.01); G01N 2021/8514 (2013.01); G01N 2021/8578 (2013.01);
Abstract

A gas analysis apparatus includes: a first reflector that reflects measurement light from a light emitting unit disposed outside a gas flue wall and transmitted through a sample gas. A light receiving unit outside the gas flue wall receives measurement light reflected by the first reflector. A second reflector outside the gas flue wall reflects measurement light toward the light receiving unit. A computing unit analyzes sample gas by allowing the measurement light to be reflected by the first reflector and performs correction or calibration of the gas analysis apparatus using known substances within an associated containing unit along the light path between the light emitting unit and the second reflector by allowing measurement light to be reflected by the second reflector. A switching unit outside the gas flue wall selectively removes or inserts the second reflector from the light path during component concentration analysis and correction or calibration, respectively.


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