The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2015
Filed:
Nov. 08, 2013
Applicant:
Ruhr-universität Bochum, Bochum, DE;
Inventors:
Brian George Heil, Wiesbaden, DE;
Uwe Czarnetzki, Bochum, DE;
Ralf Peter Brinkmann, Erkrath, DE;
Thomas Mussenbrock, Wuppertal, DE;
Assignee:
Ruhr-Universität Bochum, Bochum, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 7/24 (2006.01); H01J 31/26 (2006.01); H01J 13/48 (2006.01); H01J 15/04 (2006.01); H01J 17/36 (2006.01); H05B 37/00 (2006.01); H05B 39/00 (2006.01); H05B 41/00 (2006.01); H01J 37/32 (2006.01); H01J 37/04 (2006.01); B44C 1/22 (2006.01); C03C 15/00 (2006.01); C03C 25/68 (2006.01); C23F 1/00 (2006.01);
U.S. Cl.
CPC ...
H01J 37/04 (2013.01); H01J 37/32091 (2013.01); H01J 37/32706 (2013.01); H01J 37/32146 (2013.01); H01J 37/32165 (2013.01); H01J 37/32009 (2013.01);
Abstract
A method of establishing a DC bias in front of at least one electrode in a plasma operating apparatus by applying an RF voltage with at least two harmonic frequency components with a controlled relative phase between the components, where at least one of the higher frequency components is established as an even multiple of the lower frequency component.