The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2015
Filed:
Oct. 04, 2013
Dow Global Technologies, Llc, Midland, MI (US);
Max Markus Tirtowidjojo, Lake Jackson, TX (US);
Patrick Ho-Sing Au-Yeung, Midland, MI (US);
Debashis Chakraborty, Lake Jackson, TX (US);
Juergen Eiffler, Stade, DE;
Heinz Groenewald, Hammah, DE;
Kurt Frederick Hirsekorn, Midland, MI (US);
Manfred Kokott, Stade, DE;
William J. Kruper, Jr., Sanford, MI (US);
Thomas Ulrich Luebbe, Stade, DE;
Holger Meeman, Stade, DE;
Shirley Shaw Sexton, Cypress, TX (US);
Peter Wenzel, Buxtehude, DE;
Marcus Wobser, Stade, DE;
Dow Global Technologies LLC, Midland, MI (US);
Abstract
The present invention provides continuous, gas phase, free radical processes for the production of chlorinated and/or fluorinated propenes or higher alkenes from the reaction of chlorinated and/or fluorinated alkanes and chlorinated and/or fluorinated alkenes, wherein wherein at least a portion of any intermediate boiler by-products generated by the process are removed from the process.