The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2015
Filed:
Oct. 19, 2009
Applicants:
Marc Christophersen, Berwyn Heights, MD (US);
Bernard F. Phlips, Great Falls, VA (US);
Inventors:
Marc Christophersen, Berwyn Heights, MD (US);
Bernard F. Phlips, Great Falls, VA (US);
Assignee:
The United States of America, as represented by the Secratary of the Navy, Washington, DC (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 31/115 (2006.01); H01L 31/0224 (2006.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
H01L 31/1804 (2013.01); H01L 31/022408 (2013.01); H01L 31/115 (2013.01); Y02E 10/547 (2013.01);
Abstract
Gray tone lithography is used to form curved silicon topographies for semiconductor based solid-state imaging devices. The imagers are curved to a specific curvature and shaped directly for the specific application; such as curved focal planes. The curvature of the backside is independent from the front surface, which allows thinning of the detector using standard semiconductor processing.