The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2015
Filed:
Nov. 25, 2011
Bart Van Grinsven, Heerlen, NL;
Ward DE Ceuninck, Nerem, BE;
Patrick Wagner, Vilvoorde, BE;
IMEC, Leuven, BE;
Universiteit Hasselt, Hasselt, BE;
Abstract
A method an system is disclosed for the detection and/or allocation of at least one point mutation in target DNA and/or RNA duplexes. The method comprises obtaining a functionalized surface which is coated with probe DNA and/or RNA whereto target DNA and/or RNA duplexes are attached, contacting said functionalized surface to an electrolytic solution having a neutral pH in a flow cell and measuring a first impedance value within said electrolytic solution, and then adding a chemical to the electrolytic solution which is able to achieve denaturation of the target DNA and/or RNA. The method further comprises measuring a second impedance value within the flow cell after completion of the denaturation of the DNA and/or RNA target, and then obtaining a value representative for the impact of the chemical on the impedance of the electrolytic solution. The amount and/or allocation of point mutation(s) within the target DNA and/or RNA is then determined by calculating the denaturation-time constant based on the difference between the first and second impedance value and taking into account the impact of the chemical by third impedance value.