The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2015
Filed:
Dec. 07, 2010
Qinghua Yin, Tempe, AZ (US);
Xiwang Qi, Scottsdale, AZ (US);
Maximilian A. Biberger, Scottsdale, AZ (US);
David Leamon, Gilbert, AZ (US);
Qinghua Yin, Tempe, AZ (US);
Xiwang Qi, Scottsdale, AZ (US);
Maximilian A. Biberger, Scottsdale, AZ (US);
David Leamon, Gilbert, AZ (US);
SDCmaterials, Inc., Tempe, AZ (US);
Abstract
A method of making glass is provided. The method comprises preparing a dispersion of a nano-material. A slurry of a glass matrix material is prepared. The nano-dispersion is mixed with the matrix slurry to form a nano-dispersion/slurry mixture. The nano-dispersion/slurry mixture is dried. The nano-dispersion/slurry mixture is pressed into a final manufacture comprising a molecular structure including the nano-material bonded within and uniformly distributed throughout the molecular structure. The manufacture comprises an increased fracture toughness compared with a conventional manufacture produced without bonding the nano-material within the molecular structure. The nano-material has a size on the order of tens of nanometers. The matrix material has a size on the order of several micrometers. Five percent of the nano-dispersion/slurry mixture comprises the nano-material dispersion. Sintering is performed on the final form using a sintering process following the pressing step. The sintering process includes a hot isostatic pressing process.