The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2015
Filed:
Sep. 28, 2010
Bodo Kuehn, Gelnhausen, DE;
Bodo Kuehn, Gelnhausen, DE;
Heraeus Quarzglas GmbH & Co. KG, Hanau, DE;
Abstract
On the basis of a known method for producing a blank of titanium-doped glass with a high silica content (glass) for a mirror substrate for use in EUV lithography which has a surface region that has an outer contour, is intended to be provided with a reflective coating and is specified as a highly loaded zone when the mirror substrate is used as intended, in order to provide a blank which can be produced at low cost and nevertheless meets high requirements with respect to homogeneity and freedom from blisters and striae, a procedure which comprises the following method steps is proposed: (a) producing a front body of titanium-doped high-quality glass with dimensions more than large enough to enclose the outer contour, (b) producing a cylindrical supporting body from titanium-doped glass, (c) bonding the front body and the supporting body to form a composite body, and (d) working the composite body to form the mirror substrate blank, wherein the step of producing the front body comprises a homogenizing process involving twisting a starting body obtained in the form of a strand by flame hydrolysis of a silicon-containing compound to form a front body blank, and the supporting body is formed as a monolithic glass block with less homogeneity than the front body.