The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2015

Filed:

Feb. 25, 2013
Applicants:

Akihiro Iwamatsu, Zama, JP;

Mitsuru Nakajima, Atsugi, JP;

Tetsuya Ogata, Machida, JP;

Tsuyoshi Fujimoto, Isehara, JP;

Tokiko Inoue, Setagaya-ku, JP;

Chihiro Tanaka, Naka-gun, JP;

Inventors:

Akihiro Iwamatsu, Zama, JP;

Mitsuru Nakajima, Atsugi, JP;

Tetsuya Ogata, Machida, JP;

Tsuyoshi Fujimoto, Isehara, JP;

Tokiko Inoue, Setagaya-ku, JP;

Chihiro Tanaka, Naka-gun, JP;

Assignee:

Ricoh Company, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 1/04 (2006.01); F21V 8/00 (2006.01);
U.S. Cl.
CPC ...
G02B 6/0051 (2013.01);
Abstract

An illumination system includes a light source unit including light emitting elements arranged in array in a main scan direction to project light beams radially, and an optical guide of a long length made from a translucent material to guide incident beams from an exit surface of the light source unit in a certain direction for output, and including at least one surface with a diffuse structure to diffuse a transmitted beam or a reflected beam among the incident beams, wherein the diffuse structure is configured to diffuse the beam at a center at a larger divergence angle than at ends in the main scan direction.


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