The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2015

Filed:

May. 20, 2011
Applicants:

Seiki Miyata, Tokyo, JP;

Hiroyuki Fukushima, Nikko, JP;

Reiji Kuriki, Tokyo, JP;

Akira Ibi, Tokyo, JP;

Masateru Yoshizumi, Tokyo, JP;

Akio Kinoshita, Kasugai, JP;

Yutaka Yamada, Tokyo, JP;

Yuh Shiohara, Tokyo, JP;

Ryuji Yoshida, Nagoya, JP;

Takeharu Kato, Nagoya, JP;

Tsukasa Hirayama, Nagoya, JP;

Inventors:

Seiki Miyata, Tokyo, JP;

Hiroyuki Fukushima, Nikko, JP;

Reiji Kuriki, Tokyo, JP;

Akira Ibi, Tokyo, JP;

Masateru Yoshizumi, Tokyo, JP;

Akio Kinoshita, Kasugai, JP;

Yutaka Yamada, Tokyo, JP;

Yuh Shiohara, Tokyo, JP;

Ryuji Yoshida, Nagoya, JP;

Takeharu Kato, Nagoya, JP;

Tsukasa Hirayama, Nagoya, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 39/24 (2006.01); H01B 12/06 (2006.01); H01B 13/00 (2006.01);
U.S. Cl.
CPC ...
H04L 39/2461 (2013.01);
Abstract

Provided is a substrate for superconductive film formation, which includes a metal substrate, and an oxide layer formed directly on the metal substrate, containing chromium oxide as a major component and having a thickness of 10-300 nm and an arithmetic average roughness Ra of not more than 50 nm. A method of manufacturing a substrate for superconductive film formation, which includes forming an oxide layer directly on a metal substrate, the oxide layer containing chromium oxide as a major component and having a thickness of 10-300 nm and an arithmetic average roughness Ra of not more than 50 nm.


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