The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2015

Filed:

May. 24, 2013
Applicant:

Vito NV, Mol, BE;

Inventor:

Marjorie Dubreuil, Lummen, BE;

Assignee:

Vito NV, Mol, BE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); B05D 1/00 (2006.01); C23C 16/30 (2006.01); C23C 16/448 (2006.01); C23C 16/52 (2006.01); C23C 16/54 (2006.01); H01J 37/32 (2006.01); H05H 1/24 (2006.01); B05D 7/04 (2006.01); B05D 5/06 (2006.01);
U.S. Cl.
CPC ...
B05D 1/62 (2013.01); C23C 16/006 (2013.01); C23C 16/30 (2013.01); C23C 16/4486 (2013.01); C23C 16/52 (2013.01); C23C 16/54 (2013.01); H01J 37/32935 (2013.01); H01J 37/32972 (2013.01); H05H 1/2406 (2013.01); B05D 7/04 (2013.01); H05H 2001/2412 (2013.01); B05D 5/06 (2013.01); B05D 2252/02 (2013.01);
Abstract

Provided herein are processes for depositing a plasma coating on a substrate and coated substrates obtained thereby. More particularly, processes for characterizing a plasma coating on a substrate are provided. The process for depositing a plasma coating includes the step of exposing the substrate to a plasma. The plasma includes at least one coating precursor and one fluorophore other than the coating precursor.


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