The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2015
Filed:
May. 02, 2008
Applicants:
Gregor Eugen Morfill, Munich, DE;
Bernd Steffes, Garching, DE;
Inventors:
Gregor Eugen Morfill, Munich, DE;
Bernd Steffes, Garching, DE;
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
A61L 9/00 (2006.01); B01J 7/00 (2006.01); H05H 1/24 (2006.01); H05H 1/34 (2006.01); A61L 2/00 (2006.01);
U.S. Cl.
CPC ...
H05H 1/24 (2013.01); H05H 1/34 (2013.01); H05H 2001/3484 (2013.01);
Abstract
The invention relates to a plasma source () comprising: a conduit () carrying a gas flow and an ionization chamber () in which a plasma is generated, wherein the ionization chamber () is connected to the conduit (), so that the gas flow in the conduit () carries away gas particles out of the ionization chamber () thereby reducing the pressure in the ionization chamber ().