The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2015

Filed:

Apr. 22, 2010
Applicants:

Ping Chang, Danville, CA (US);

Gregg Wallace, Little Silver, NJ (US);

Inventors:

Ping Chang, Danville, CA (US);

Gregg Wallace, Little Silver, NJ (US);

Assignee:

Ferrotec (USA) Corporation, Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 14/24 (2006.01); C23C 14/04 (2006.01); C23C 14/50 (2006.01);
U.S. Cl.
CPC ...
C23C 14/24 (2013.01); C23C 14/044 (2013.01); C23C 14/505 (2013.01);
Abstract

A vapor deposition device using a lift-off process includes an evaporation source, a support frame mounted for rotation about a first axis that passes through the evaporation source, a central dome-shaped wafer holder mounted to the support frame wherein a centerpoint of the central dome-shaped wafer holder is aligned with the first axis, an orbital dome-shaped wafer holder mounted to the support frame in a position offset from the first axis and rotatable about a second axis that passes through a centerpoint of the orbital dome-shaped wafer holder and the evaporation source, and a plurality of wafer positions on the central dome-shaped wafer holder and the orbital dome-shaped wafer holder where each of the wafer positions are offset from the first axis and the second axis.


Find Patent Forward Citations

Loading…