The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2015
Filed:
Apr. 04, 2012
Applicants:
Keiichi Akinaga, Kanagawa, JP;
Tadashi Okawa, Chiba, JP;
Kazuhiro Nishijima, Chiba, JP;
Eiji Kitaura, Tokyo, JP;
Inventors:
Keiichi Akinaga, Kanagawa, JP;
Tadashi Okawa, Chiba, JP;
Kazuhiro Nishijima, Chiba, JP;
Eiji Kitaura, Tokyo, JP;
Assignee:
Dow Corning Toray Co., Ltd., Chiyoda-Ku, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 5/00 (2006.01); C09D 183/04 (2006.01); F28F 3/00 (2006.01); C08L 83/04 (2006.01); C08G 77/08 (2006.01); C08G 77/12 (2006.01); F28F 19/02 (2006.01);
U.S. Cl.
CPC ...
C09D 5/00 (2013.01); C09D 183/04 (2013.01); F28F 19/02 (2013.01); F28F 3/00 (2013.01); C08L 83/04 (2013.01); C08G 77/12 (2013.01);
Abstract
A substrate is surface treated using a composition for forming a film that comprises (A) an organoalkoxysilane, (B) an organopolysiloxane having a silicon-bonded hydrogen atom, and (C) a condensation reaction catalyst. This composition for forming a film can form a highly hydrophobic water repellent film provided with sufficient water shedding performance. It is possible to provide a highly hydrophobic substrate such as a heat dissipating body.