The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2014

Filed:

Feb. 13, 2013
Applicants:

Bipul C. Paul, Clifton Park, NY (US);

Anurag Mittal, Wappinger Falls, NY (US);

Pierre Malinge, La Tessoualle, FR;

Inventors:

Bipul C. Paul, Clifton Park, NY (US);

Anurag Mittal, Wappinger Falls, NY (US);

Pierre Malinge, La Tessoualle, FR;

Assignee:

GlobalFoundries Inc., Grand Cayman, KY;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8238 (2006.01); G11C 11/412 (2006.01); G06F 17/50 (2006.01); H01L 27/02 (2006.01); H01L 27/11 (2006.01);
U.S. Cl.
CPC ...
G11C 11/412 (2013.01); G06F 17/5068 (2013.01); H01L 27/0207 (2013.01); H01L 27/1104 (2013.01);
Abstract

Methodology enabling a reduction of edge and strap cell size, and the resulting device are disclosed. Embodiments include: providing first and second NW regions on a substrate; providing first and second RX regions on the first and second NW regions, respectively; providing a contact on the substrate connecting the first and second RX regions; and providing a dummy PC on the substrate connecting the first and second RX regions. Other embodiments include: determining an RX region of an IC design; determining a PPLUS mask region extending along a horizontal direction and being on an entire upper surface of the RX region; determining a NW region extending along a vertical direction and separated from the RX region; and comparing an area of an overlap of the NW region and PPLUS mask region to a threshold value.


Find Patent Forward Citations

Loading…