The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2014

Filed:

Jun. 21, 2013
Applicant:

Linear Technology Corporation, Milpitas, CA (US);

Inventor:

David Alan Pruitt, San Jose, CA (US);

Assignee:

Linear Technology Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/02 (2006.01); H01L 23/495 (2006.01); H01L 23/492 (2006.01); H01L 21/50 (2006.01);
U.S. Cl.
CPC ...
H01L 23/495 (2013.01); H01L 23/492 (2013.01); H01L 23/49537 (2013.01); H01L 23/49562 (2013.01); H01L 21/50 (2013.01); H01L 2224/32245 (2013.01); H01L 2924/10253 (2013.01); H01L 2224/33181 (2013.01);
Abstract

A method of manufacturing integrated circuit (IC) devices includes the steps of providing a first frame that has openings each having a perimeter with shaped notches, placing a first die in at least one of the openings, and placing a second frame over the first frame. The second frame has a first partial dam bar with a first shaped tip that fits into a first shaped notch of the first frame. The method also includes the step of placing a third frame over the second frame. The third frame has a second partial dam bars with a second shaped tip that fits into a second shaped notch of the first frame. Each perimeter and the respective first and second partial dam bars cooperate to form a continuous dam completely encircling the die within the respective opening.


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