The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2014

Filed:

Jul. 08, 2013
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Chidambaram G. Kallingal, Poughkeepsie, NY (US);

YuYang Sun, Wappingers Falls, NY (US);

Assignee:

GLOBALFOUNDRIES Inc., Grand Cayman, KY;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/70 (2012.01);
U.S. Cl.
CPC ...
G03F 1/70 (2013.01);
Abstract

One illustrative method disclosed herein includes the steps of decomposing an initial overall target exposure pattern into at least a first decomposed sub-target pattern and a second decomposed sub-target pattern, performing first and second retargeting processes on the first and second decomposed sub-target patterns while using the other sub-target pattern as a reference layer, respectively, to thereby define retargeted first and second decomposed sub-target patterns, respectively, and, after performing the first and second retargeting processes, performing at least one process operation to determine if each of the retargeted first decomposed sub-target pattern and the retargeted second decomposed sub-target pattern is in compliance with at least one design rule.


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