The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2014
Filed:
Jan. 08, 2010
Applicants:
Kazuharu Suzuki, Ibaraki, JP;
Masayuki Saito, Ibaraki, JP;
Inventors:
Kazuharu Suzuki, Ibaraki, JP;
Masayuki Saito, Ibaraki, JP;
Assignee:
Tanaka Kikinzoku Kogyo K.K., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/18 (2006.01); H01L 21/28 (2006.01); H01L 21/285 (2006.01); H01L 49/02 (2006.01); C07F 15/00 (2006.01);
U.S. Cl.
CPC ...
C07F 15/0046 (2013.01); C23C 16/18 (2013.01); H01L 21/28194 (2013.01); H01L 21/28556 (2013.01); H01L 28/65 (2013.01);
Abstract
To provide a ruthenium compound suitable for a chemical vapor deposition method (CVD method). A liquid cyclooctatetraenetricarbonyl ruthenium complex represented by the following Formula (1) is obtained by irradiating a solution mixture of dodecacarbonyl triruthenium and a cyclooctatetraene with light. A satisfactory ruthenium film or ruthenium oxide film can be easily obtained by a chemical vapor deposition method using the complex as a raw material.