The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2014

Filed:

Feb. 25, 2013
Applicant:

Omron Corporation, Kyoto-shi, JP;

Inventors:

Gouo Kurata, Tsurugashima, JP;

Koichi Takemura, Konan, JP;

Kazuhide Hirota, Moriyama, JP;

Jun Kishimoto, Ogaki, JP;

Masayuki Shinohara, Nagaokakyou, JP;

Assignee:

OMRON Corporation, Kyoto, JP;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
F21V 7/04 (2006.01); F21V 8/00 (2006.01);
U.S. Cl.
CPC ...
G02B 6/0035 (2013.01);
Abstract

A variation in luminance is reduced near a light source without decreasing intensity of a light exit pattern. A light source is disposed and a light exit pattern is formed. The light exit pattern reflects light guided in a light guide plate and outputs the light. In inclined angles of tangents of the light exit patterns in a section passing through a center axis of the light exit pattern, a largest inclined angle of the tangent is defined as a maximum inclined angle of the light exit pattern. At this time, in the light exit pattern provided in the light guide plate, the maximum inclined angle is decreased with increasing distance from a light incident surface in a region near the light incident surface, and the maximum inclined angle is decreased or kept constant with increasing distance from the light incident surface in a region distant from the region near the light incident surface.


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