The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 23, 2014

Filed:

Mar. 25, 2013
Applicants:

Zhang Wei, Nagoya, JP;

Atsushi Hayakawa, Okazaki, JP;

Inventors:

Zhang Wei, Nagoya, JP;

Atsushi Hayakawa, Okazaki, JP;

Assignee:

Brother Kogyo Kabushiki Kaisha, Nagoya-shi, Aichi-ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G 15/00 (2006.01); G03G 21/16 (2006.01); G03G 21/18 (2006.01);
U.S. Cl.
CPC ...
G03G 21/18 (2013.01); G03G 21/1666 (2013.01); G03G 21/1685 (2013.01); G03G 2221/169 (2013.01); G03G 21/1619 (2013.01);
Abstract

There is provided an image forming apparatus including a main apparatus body, a photoconductor, an exposure mechanism, a frame, and a regulating mechanism. The regulating mechanism includes a fixing member, a movable member, and a biasing member. The frame includes a first contacting surface. The exposure mechanism includes second and third contacting surfaces, and the fixing member includes a fourth contacting surface, first and second facing surfaces. The movable member includes third and fourth facing surfaces. When the exposure mechanism is disposed at the approach position, the biasing member allows the second and third facing surfaces to make a contact with the second and third contacting surfaces, respectively. When the exposure mechanism is disposed at the separation position, the biasing member allows the first and fourth facing surfaces to make a contact with the first and fourth contacting surfaces, respectively.


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