The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2014
Filed:
Mar. 01, 2013
Vladimir Jellus, Kirchehrenbach, DE;
Mathias Nittka, Baiersdorf, DE;
Vladimir Jellus, Kirchehrenbach, DE;
Mathias Nittka, Baiersdorf, DE;
Siemens Aktiengesellschaft, Munich, DE;
Abstract
In a method processor and magnetic resonance (MR) system to generate MR slice exposures of an examination subject, measurement data for a stack of measurement slices through the examination subject are initially acquired using a series of slice measurement sequences. The series of slice measurement sequences is designed to allow a separation of a first material from a second material that has a defined chemical shift relative to said first material, and the position of a measurement slice with measurement data for the first material is spatially shifted relative to the position of a measurement slice with measurement data for the second material. Combination slice exposures are then formed by combining measurement data of the first material from at least a first slice measurement sequence with measurement data of the second material from at least one second slice measurement sequence, such that the image data of the first and second materials are spatially arranged with precise positioning relative to one another, at least within a predetermined degree of tolerance in the combination slice exposures.