The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 23, 2014

Filed:

Nov. 30, 2012
Applicant:

Tsinghua University, Beijing, CN;

Inventors:

Liyang Pan, Beijing, CN;

Lifang Liu, Beijing, CN;

Assignee:

Tsinghua University, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 16/04 (2006.01); H01L 21/28 (2006.01); H01L 29/10 (2006.01); H01L 27/115 (2006.01); H01L 29/792 (2006.01); G11C 11/56 (2006.01);
U.S. Cl.
CPC ...
G11C 16/0466 (2013.01); H01L 21/28282 (2013.01); G11C 16/0475 (2013.01); H01L 29/1041 (2013.01); H01L 27/11563 (2013.01); H01L 29/7923 (2013.01); G11C 16/0483 (2013.01); G11C 11/5621 (2013.01);
Abstract

A NOR flash memory array structure is provided, comprising: a substrate (); and a two dimensional memory array structure formed on the substrate () and comprising: a plurality of memory cell columns arranged in a first direction, and each memory cell column including a plurality of memory cells (), in which each memory cell () comprises: a channel region () located on the substrate (), a gate structure located on the channel region () and formed by a tunneling oxide layer (), a silicon nitride layer (), a barrier oxide layer () and a polysilicon gate layer () stacked sequentially, a source region () and a drain region () located at a first edge and a second edge of the gate structure respectively; a plurality of word lines WL; a source line SL for connecting the source regions of all the memory cells; and a plurality of bit lines BL.


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