The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2014
Filed:
Nov. 07, 2011
Yasujiro Kiyota, Tokyo, JP;
Yoichi Wada, Kawasaki, JP;
Hiroaki Kii, Fujisawa, JP;
Nikon Corporation, Tokyo, JP;
Abstract
The focus control culture observation apparatus enable simple and reliable detection of a focusing position of an objective lens on a subject and with certainty. When a focusing position is detected, an area, which includes an edge portion of the culture medium drop is selected as an AF area which is to be a target of detecting the focusing position of the objective lens on the culture medium drop. The apparatus detects the focusing position on the culture medium drop based on an observation image of the AF area. By detecting the focusing position as a targeting area that is different from an area which is near the edge of the culture container and where illumination unevenness is generated, the detection accuracy can be improved.