The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2014
Filed:
Feb. 21, 2013
Canon Kabushiki Kaisha, Tokyo, JP;
Kimitaka Ozawa, Utsunomiya, JP;
Michio Yanagisawa, Utsunomiya, JP;
Canon Kabushiki Kaisha, , JP;
Abstract
A lithography apparatus includes a deflector configured to deflect the charged particle beam to scan the charged particle beam on the substrate in a scan direction; a detector including a shield for shielding the charged particle beam, and configured to detect an intensity of a charged particle beam not shielded by the shield; and a processor configured to process a signal obtained with the detector scanned with the charged particle beam in the scan direction by the deflector, wherein an effective region of the shield has a shape such that a position of an edge thereof in the scan direction continuously changes along the edge, and wherein the processor is configured to process the signal with respect to a plurality of positions of the edge to determine a relationship between a command value to the deflector and a scan position of the charged particle beam.