The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 23, 2014

Filed:

Mar. 17, 2013
Applicant:

Stanley Electric Co., Ltd., Meguro-ku, Tokyo, JP;

Inventors:

Takako Chinone, Tokyo, JP;

Mamoru Miyachi, Okegawa, JP;

Tatsuma Saito, Yokohama, JP;

Takanobu Akagi, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/30 (2006.01); H01L 27/15 (2006.01); H01L 33/60 (2010.01); H01L 23/00 (2006.01); H01L 33/00 (2010.01); H01L 33/64 (2010.01); H01L 23/373 (2006.01); H01L 33/40 (2010.01);
U.S. Cl.
CPC ...
H01L 33/60 (2013.01); H01L 24/29 (2013.01); H01L 24/32 (2013.01); H01L 24/83 (2013.01); H01L 33/0079 (2013.01); H01L 33/641 (2013.01); H01L 2224/29111 (2013.01); H01L 2224/29144 (2013.01); H01L 2224/83193 (2013.01); H01L 2224/83203 (2013.01); H01L 2224/83805 (2013.01); H01L 2924/013 (2013.01); H01L 23/3735 (2013.01); H01L 33/405 (2013.01); H01L 2933/0075 (2013.01); H01L 2924/01322 (2013.01);
Abstract

A method of manufacturing a semiconductor element includes forming an element structure layer having a semiconductor layer, on a first substrate. The method also includes forming a first bonding layer on the element structure layer. The method also includes forming a second bonding layer on a second substrate. The method also includes performing heating pressure-bonding on the first and second bonding layers, with the first and second bonding layers facing each other. One of the first bonding layer and the second bonding layer is an AU layer, and the other is an AuSn layer. The AuSn layer has a surface layer having an Sn content of between 85 wt % (inclusive) and 95 wt % (inclusive).


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