The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2014
Filed:
Dec. 13, 2011
Applicants:
Koji Hasegawa, Joetsu, JP;
Takeshi Sasami, Joetsu, JP;
Yuji Harada, Joetsu, JP;
Taku Morisawa, Joetsu, JP;
Inventors:
Koji Hasegawa, Joetsu, JP;
Takeshi Sasami, Joetsu, JP;
Yuji Harada, Joetsu, JP;
Taku Morisawa, Joetsu, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/11 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0395 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01); G03F 7/11 (2013.01);
Abstract
A polymer having a partial structure —C(CF)OH in recurring units is used as an additive to formulate a resist composition. A photoresist film formed from the resist composition has sufficient barrier performance against water to prevent any resist components from being leached in water and thus minimize any change of pattern profile.