The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 23, 2014

Filed:

Jul. 23, 2012
Applicants:

Lifeng Wang, Shenzhen, CN;

Yuchun Hsiao, Shenzhen, CN;

Yajun Yu, Shenzhen, CN;

Yanxue Zhang, Shenzhen, CN;

Inventors:

Lifeng Wang, Shenzhen, CN;

Yuchun Hsiao, Shenzhen, CN;

Yajun Yu, Shenzhen, CN;

Yanxue Zhang, Shenzhen, CN;

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F 1/1333 (2006.01);
U.S. Cl.
CPC ...
G02F 1/133308 (2013.01); G02F 2001/133314 (2013.01);
Abstract

At least one stress concentration factor is arranged in a bending position of forming the protrusion structure on a surface of the backplane. Then, a shape of the protrusion structure is formed by stamping. In the present disclosure, because the bending position during stretching the protrusion structure is firstly configured with a plurality of stress concentration factors in the stretching process of the protrusion structure, when the protrusion structure is stretched, stress concentration occurs in the position with the stress concentration factors.


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