The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2014
Filed:
Nov. 05, 2012
Ming Lai, Dublin, CA (US);
Meijuan Yuan, Dublin, CA (US);
Ming Lai, Dublin, CA (US);
Meijuan Yuan, Dublin, CA (US);
MD Lasers & Instruments, Inc., Pleasanton, CA (US);
Abstract
The present invention contemplates a refraction system facilitating for contact lens fitting via measuring the patient's refraction on the corneal plane and via introducing a conjugated plane of the corneal plane for insertion of a contact lens simulator or phase plate. The present invention also contemplates a refraction system to integrate the objective and subjective measurement into a single instrument. The present invention further contemplates a refraction system with open-field and binocular viewing to overcome instrument myopia and to measure accommodation. The present invention also further contemplates a refraction system employing a pair of optical trombones to eliminate the need of flipping plurality sets of trial lenses for defocus corrections. The present invention even further contemplates a multiple vergence acuity chart to facilitate patient's judgment of best corrected visual acuity. The present invention is thus aimed to provide a refraction system that overcomes the identified issues with the commonly used auto-refractor and phoropter and that enables effective use of contact lens simulators or phase plates to facilitate fitting of multifocal contact lenses for presbyopia correction.