The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2014
Filed:
Apr. 29, 2011
Jeffrey Kaskey, Livermore, CA (US);
Thomas Laidig, Richmond, CA (US);
Dave Markle, Saratoga, CA (US);
Jang-fung Chen, Cupertino, CA (US);
Jeffrey Kaskey, Livermore, CA (US);
Thomas Laidig, Richmond, CA (US);
Dave Markle, Saratoga, CA (US);
Jang-Fung Chen, Cupertino, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
System and method for handling substrates in a lithography manufacturing process are disclosed. In one embodiment, a system for handling substrates in a lithography manufacturing process includes a plurality of porous chucks positioned above a substrate for imaging, a plurality of pressure sources configured to apply pressured air towards the substrate through the plurality of porous chucks, a plurality of vacuums configured to apply suction force away from the substrate, and a controller with control logic configured to hold the substrate in place by controlling the pressured air applied by the plurality of pressure sources and the suction force generated by the plurality of vacuums.