The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2014
Filed:
Oct. 23, 2012
Apple Inc., Cupertino, CA (US);
Date Jan Willem Noorlag, Seongnam-si, KR;
Apple Inc., Cupertino, CA (US);
Abstract
A semiconductor device includes a PFET transistor (a PMOS FET) having a poly(silicon) layer with a p-type doped portion and an n-type doped portion. The p-type doped portion is located above a channel region of the transistor and the n-type doped portion is located in an end portion of the poly layer outside the channel region. The poly layer may be formed by doping portions of an amorphous silicon layer with either the p-type dopant or the n-type dopant and then annealing the amorphous silicon layer to diffuse the dopants and crystallize the amorphous silicon to form polysilicon. The n-type doped portion of the poly layer may provide an electrical shunt in the end portion of the poly layer to reduce any effects of insufficient diffusion of the p-type dopant in the poly layer.