The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 16, 2014

Filed:

Mar. 08, 2012
Applicants:

Anny Flory, South Plainfield, NJ (US);

Michael L. Smith, Lake Jackson, TX (US);

Chester J. Kmiec, Phillipsburg, NJ (US);

Robert F. Eaton, Belle Mead, NJ (US);

Alfred E. Vigil, Houston, TX (US);

Inventors:

Anny Flory, South Plainfield, NJ (US);

Michael L. Smith, Lake Jackson, TX (US);

Chester J. Kmiec, Phillipsburg, NJ (US);

Robert F. Eaton, Belle Mead, NJ (US);

Alfred E. Vigil, Houston, TX (US);

Assignee:

Dow Global Technologies LLC, Midland, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 2/04 (2006.01); C08F 2/38 (2006.01); C08F 110/02 (2006.01); B01J 19/18 (2006.01);
U.S. Cl.
CPC ...
C08F 110/02 (2013.01);
Abstract

The present disclosure provides a process for producing low density polyethylene with a dissipation factor less than or equal to 1.48×10radian at 2.47 GHz. The process includes free radical high pressure polymerization of ethylene and separation of the unreacted species from the resultant polyethylene to form a recycle stream. The process further includes purging dissipative components from the recycle stream. The purged recycle stream is then introduced into the polymerization reactor.


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