The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2014
Filed:
May. 29, 2012
Applicants:
Quan Zhou, Shenzhen, CN;
Xin-wu Guan, Shenzhen, CN;
Po-feng Ho, New Taipei, TW;
Inventors:
Assignees:
Shenzhen Futaihong Precision Industry Co., Ltd., Shenzhen, CN;
FIH (Hong Kong) Limited, Kowloon, HK;
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); C22F 1/00 (2006.01); C21D 6/00 (2006.01); B32B 15/01 (2006.01);
U.S. Cl.
CPC ...
B44C 1/227 (2013.01); B32B 15/01 (2013.01); C22F 1/00 (2013.01); C21D 6/00 (2013.01); Y10S 148/903 (2013.01);
Abstract
A method for forming pattern on substrate comprises steps of: providing a metal substrate; amorphousizing the metal substrate to from an amorphous pattern layer in the metal substrate; etching the metal substrate and forming an etching portion in the surface of the metal substrate which is not covered with the amorphous pattern layer. The article manufactured by the method is also provided.
Zhou, Quan. (2014). Method for forming patterns on substrates and articles manufactured by the same (U.S. Patent No. 8911876). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8911876
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile