The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2014
Filed:
Oct. 05, 2012
Applicant:
Seagate Technology, Lcc, Cupertino, CA (US);
Inventors:
Assignee:
Seagate Technology LLC, Cupertino, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/02 (2006.01); C04B 41/52 (2006.01); C04B 41/00 (2006.01); G11B 5/73 (2006.01); G11B 7/24 (2013.01); H01F 10/24 (2006.01); G11B 7/26 (2006.01); B32B 27/08 (2006.01); C04B 41/89 (2006.01); H05K 1/03 (2006.01);
U.S. Cl.
CPC ...
B32B 27/08 (2013.01); C04B 41/524 (2013.01); C04B 41/009 (2013.01); G11B 5/7315 (2013.01); C04B 41/52 (2013.01); G11B 7/24 (2013.01); H01F 10/245 (2013.01); G11B 7/26 (2013.01); C04B 41/89 (2013.01); H05K 1/0333 (2013.01); C04B 41/522 (2013.01);
Abstract
The embodiments disclose a block copolymer assembly structure, including a first pattern and second pattern with a first density of patterned features integrated in data and servo zones, a silicon substrate with thin film layers deposited thereon and patterned using the first density of first pattern and second pattern features and a template fabrication pattern with a second density greater than the first density created using ordered block copolymer periodic structures across a portion of the substrate.