The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2014
Filed:
Jun. 15, 2010
Applicants:
Kock-yee Law, Penfield, NY (US);
Hong Zhao, Webster, NY (US);
Inventors:
Kock-Yee Law, Penfield, NY (US);
Hong Zhao, Webster, NY (US);
Assignee:
Xerox Corporation, Norwalk, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/16 (2006.01);
U.S. Cl.
CPC ...
B41J 2/1631 (2013.01); B41J 2/1606 (2013.01); B41J 2/161 (2013.01); B41J 2/162 (2013.01); B41J 2/1628 (2013.01); B41J 2/1642 (2013.01); B41J 2/1645 (2013.01); B41J 2/1646 (2013.01);
Abstract
Described is a process for producing an inkjet printhead comprising an aperture face having an oleophobic surface. The process includes forming an aperture plate by disposing a silicon layer on an aperture plate; using photolithography to create a textured pattern on an outer surface of the silicon layer; and chemically modifying the textured surface by disposing a conformal, oleophobic coating on the textured surface. The oleophobic aperture plate may be used as a front face surface for an inkjet printhead.