The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2014
Filed:
Jan. 07, 2011
Kohei Matsui, Tokyo, JP;
Ryosuke Yasui, Tokyo, JP;
Kohei Matsui, Tokyo, JP;
Ryosuke Yasui, Tokyo, JP;
Toppan Printing Co., Ltd., Tokyo, JP;
Abstract
An exposure method for color filter substrate is provided. As shown in FIG.(), exposure is performed while a substrateto which a photoresist has been applied is being transported in the Y direction, to simultaneously form first layersand layersin first non-display regions(regions indicated by hatching sloping upward to the right) and the display region, respectively, on the substrate. Next, as shown in (b), the substrateis rotated by 90 degrees, and exposure is performed while the substrateis being transported in the X direction, to form second layersin second non-display regions(regions indicated by hatching sloping upward to the right). Thus, dummy PSsand dummy PSsarranged with desired pitches and having desired shapes can be formed in the first non-display regionsand the second non-display regions, respectively.