The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2014

Filed:

Oct. 26, 2011
Applicants:

Masami Hayashi, Kumamoto, JP;

Osamu Miyagawa, Kumamoto, JP;

Toru Takeguchi, Kumamoto, JP;

Shinichi Yano, Kumamoto, JP;

Yasuyoshi Itoh, Kumamoto, JP;

Shingo Nagano, Tokyo, JP;

Inventors:

Masami Hayashi, Kumamoto, JP;

Osamu Miyagawa, Kumamoto, JP;

Toru Takeguchi, Kumamoto, JP;

Shinichi Yano, Kumamoto, JP;

Yasuyoshi Itoh, Kumamoto, JP;

Shingo Nagano, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/136 (2006.01); G02F 1/1343 (2006.01); G02F 1/1345 (2006.01); H01L 27/12 (2006.01); G02F 1/1362 (2006.01);
U.S. Cl.
CPC ...
H01L 27/124 (2013.01); G02F 1/13452 (2013.01); G02F 1/136286 (2013.01);
Abstract

A thin film transistor array substrate of the present invention having an array area, and a frame area, the thin film transistor array substrate includes: a thin film transistor; an upper metal pattern formed by the same material as source and drain electrodes at the same layer; a transparent conductive film pattern; and an upper layer insulation film, wherein the transparent conductive film pattern has: a first-type transparent conductive film pattern provided to located within one of a pattern of the electrode pattern and a pattern of the metal pattern, as viewed from the top side, and to not cover pattern end faces of the electrode pattern or the metal pattern; and a second-type transparent conductive film pattern provided to stick out from an inside of at least a portion of one of the patterns, as viewed from the top side and to cover the pattern end faces.


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