The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2014

Filed:

Nov. 09, 2009
Applicants:

Akihiro Usujima, Kawasaki, JP;

Junichi Ariyoshi, Kawasaki, JP;

Taiji Ema, Kawasaki, JP;

Inventors:

Akihiro Usujima, Kawasaki, JP;

Junichi Ariyoshi, Kawasaki, JP;

Taiji Ema, Kawasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/088 (2006.01); H01L 27/115 (2006.01); H01L 21/28 (2006.01); H01L 21/8234 (2006.01); H01L 27/105 (2006.01); H01L 29/788 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11526 (2013.01); H01L 21/28273 (2013.01); H01L 21/823418 (2013.01); H01L 21/823456 (2013.01); H01L 21/823462 (2013.01); H01L 21/823468 (2013.01); H01L 27/105 (2013.01); H01L 27/11546 (2013.01); H01L 29/7881 (2013.01);
Abstract

A semiconductor device includes a memory transistor including a first side wall insulating film and a second side wall insulating film disposed on the outside; a high-voltage transistor including a third side wall insulating film having the same composition as that of the first side wall insulating film, and a fourth side wall insulating film having the same composition as that of the second side wall insulating film, the fourth side wall insulating film being disposed on the outside; and a low-voltage transistor including a fifth side wall insulating film having the same composition as that of the second and fourth side wall insulating films. The memory transistor, the high-voltage transistor, and the low-voltage transistor are disposed on the same substrate. A total side wall spacer width of the low-voltage transistor is smaller than that of the high-voltage transistor by a thickness corresponding to the third side wall insulating film.


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