The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2014

Filed:

Aug. 27, 2010
Applicants:

Takahiro Kitano, Hyogo, JP;

Kozo Nogi, Hyogo, JP;

Kunihiko Ishizaki, Hyogo, JP;

Inventors:

Takahiro Kitano, Hyogo, JP;

Kozo Nogi, Hyogo, JP;

Kunihiko Ishizaki, Hyogo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 2/01 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed is a method for producing a water absorbent resin, by which a surface-crosslinked water absorbent resin having excellent physical properties can be efficiently obtained at low cost, while assuring high productivity. When the production scale is increased to a continuous production at 1 t/hr or more, the physical properties are improved and stabilized (for example, standard deviation of the physical properties is reduced) by a surface-crosslinking treatment, and the absorption against pressure (AAP) and liquid permeability (SFC) are further improved. Specifically disclosed is a method for producing a water absorbent resin, which is characterized in that the stirring shaft of the continuous mixing apparatus for the surface-crosslinking agent is heated during the mixing step of the surface-crosslinking agent or that the continuous mixing apparatus for the surface-crosslinking agent is operated at a pressure that is reduced relative to the ambient pressure and a gas flow is passed through the mixing apparatus during the mixing of the surface-crosslinking agent so that the gas flow in the mixing apparatus is 40° C. or more (when defined with respect to the gas temperature at the exit).


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